US Patent Issued to ONEJOON on July 1 for "Injection device for discharging a gas, process gas system for supplying a process gas, and device and method for the thermal or thermo-chemical treatment of material" (German Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,343,717, issued on July 1, was assigned to ONEJOON GMBH (Bovenden, Germany).

"Injection device for discharging a gas, process gas system for supplying a process gas, and device and method for the thermal or thermo-chemical treatment of material" was invented by Arian Esfehanian (Boblingen, Germany) and Daniel Hipp (Reutlingen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "Injection device (56) for discharging a gas (54), in particular a process gas (54), onto a material (12), in particular onto a battery cathode material (14) that is to be calcined, having at least one inlet (58) through which the gas (54) can be supplied to the injection device...