US Patent Issued to OMRON on Oct. 14 for "Model generation apparatus, estimation apparatus, model generation method, and computer-readable storage medium storing a model generation program including training a model by converting training data to deliberately reduce estimation performance for improved defect detection and feature identification" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,176, issued on Oct. 14, was assigned to OMRON Corp. (Kyoto, Japan).

"Model generation apparatus, estimation apparatus, model generation method, and computer-readable storage medium storing a model generation program including training a model by converting training data to deliberately reduce estimation performance for improved defect detection and feature identification" was invented by Ryo Yonetani (Tokyo), Atsushi Hashimoto (Tokyo) and Yamato Okamoto (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A model generation apparatus according to one or more embodiments executes operations, with respect to each of learning data sets. The operations...