US Patent Issued to OMRON on Jan. 13 for "Robot model learning device, robot model machine learning method, recording medium storing robot model machine learning program, robot control device, robot control method, and recording medium storing robot control program" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,521,876, issued on Jan. 13, was assigned to OMRON Corp. (Kyoto, Japan).

"Robot model learning device, robot model machine learning method, recording medium storing robot model machine learning program, robot control device, robot control method, and recording medium storing robot control program" was invented by Masashi Hamaya (Tokyo) and Kazutoshi Tanaka (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A non-transitory recording medium storing a robot control device acquires an actual value of a position and a posture of a robot and an actual value of an external force applied to the robot, executes a robot model including a state transition model...