ALEXANDRIA, Va., June 16 -- United States Patent no. 12,310,140, issued on May 20, was assigned to OMNIVISION SEMICONDUCTOR (SHANGHAI) Co. LTD. (Shanghai).
"Image sensor and method for fabricating same" was invented by Chun-Sheng Fan (Hsinchu, Taiwan) and Cheng Hu (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "An image sensor and method for fabricating are provided. The image sensor includes: a semiconductor substrate with multiple pixel regions formed thereon; adhesive frame formed on the semiconductor substrate, the adhesive frame including a peripheral adhesive frame arranged along the periphery of the semiconductor substrate and multiple reaction well adhesive frames disposed within the periphe...