US Patent Issued to NVIDIA on April 8 for "Parallel mask rule checking on evolving mask shapes in optical proximity correction flows" (Oregon, California Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,271,676, issued on April 8, was assigned to NVIDIA Corp. (Santa Clara, Calif.).

"Parallel mask rule checking on evolving mask shapes in optical proximity correction flows" was invented by Kumara Narasimha Sastry Kunigal (Portland, Ore.), Saumyadip Mukhopadhyay (Beaverton, Ore.), Kasyap Thottasserymana Vasudevan (Folsom, Calif.) and Vivek Kumar Singh (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure relate to parallel mask rule checking on evolving mask shapes in optical proximity correction (OPC) flows for integrated circuit designs. Systems and methods are disclosed that perform mask (manufacturing) ru...