ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,279, issued on Sept. 23, was assigned to NUVOTON TECHNOLOGY CORPORATION JAPAN (Kyoto, Japan).

"Non-volatile storage device and method of manufacturing the same" was invented by Atsushi Himeno (Osaka, Japan), Yukio Hayakawa (Kyoto, Japan), Koichi Kawashima (Kyoto, Japan) and Ryutaro Yasuhara (Hyogo, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a non-volatile storage device, a first lower-layer metal wire, a lower plug, a variable resistance element, an upper plug, and a first upper-layer metal wire are formed in that order from below in a storage region, and a second lower-layer metal wire, a first via, a middle-layer metal wire, a second...