ALEXANDRIA, Va., Feb. 26 -- United States Patent no. 12,233,290, issued on Feb. 25, was assigned to NuGeneration Technologies LLC (Emeryville, Calif.).
"Multi-layer face mask" was invented by Donato Polignone (Emeryville, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A face mask has a first woven filter layer comprising a first yarn and a second woven filter layer comprising a second yarn. The second yarn is disposed at a non-right and non-parallel angle relative to the first yarn. The second woven filter layer is stitched to the first woven filter layer. A third woven filter layer with a third yarn can be added with the third yarn at a non-right and non-parallel angle relative to both the first yarn...