ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,202, issued on May 20, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Multi-electron beam inspection apparatus, multipole array control method, and multi-electron beam inspection method" was invented by Yuichi Maekawa (Yokohama, Japan) and Atsushi Ando (Edogawa-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A multi-electron beam inspection apparatus includes first sample hold circuits, each configured to include a capacitor and a switch arranged for each of electrodes of each of a plurality of multipoles, and to hold, using the capacitor and the switch, a potential to be applied to the each of the electrodes, power sources con...