ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,015, issued on March 25, was assigned to NuFlare Technology Inc. (Yokohama, Japan).
"Electron beam inspection apparatus" was invented by Atsushi Ando (Edogawa-ku, Japan) and Takahiro Murata (Zushi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, an electron beam inspection apparatus includes an optical system irradiating a substrate with primary electron beams, a beam separator separating, from the primary electron beams, secondary electron beams emitted as a result of irradiating the substrate with the primary electron beams, a detector detecting the secondary electron beams separated, a movable stage on which the substrate...