US Patent Issued to NuFlare Technology on June 24 for "Vapor phase growth method using reflector with changeable pattern" (Japanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,338,543, issued on June 24, was assigned to NuFlare Technology Inc. (Kanagawa, Japan).

"Vapor phase growth method using reflector with changeable pattern" was invented by Yoshitaka Ishikawa (Yokohama, Japan), Takehiko Kobayashi (Shizuoka, Japan), Hideshi Takahashi (Yokohama, Japan), Yasushi Iyechika (Chiba, Japan), Takashi Haraguchi (Fujisawa, Japan) and Kiyotaka Miyano (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A vapor phase growth apparatus according to an embodiment includes a reaction chamber, a holder provided in the reaction chamber, the holder holding a substrate, a heater heating the substrate, a first reflector facing the holder, the...