US Patent Issued to NuFlare Technology on July 8 for "Pattern inspection apparatus and pattern inspection method" (Japanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,831, issued on July 8, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Pattern inspection apparatus and pattern inspection method" was invented by Masataka Shiratsuchi (Yokohama, Japan), Chosaku Noda (Yokohama, Japan) and Tadayuki Sugimori (Setagaya-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pattern inspection apparatus includes a secondary electron image acquisition mechanism to include a deflector deflecting multiple primary electron beams and a detector detecting multiple secondary electron beams, and acquire a secondary electron image corresponding to each of the multiple primary electron beams by scanning a target obj...