US Patent Issued to NuFlare Technology on Jan. 13 for "Pattern inspection apparatus, and method for acquiring alignment amount between outlines" (Japanese Inventor)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,425, issued on Jan. 13, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Pattern inspection apparatus, and method for acquiring alignment amount between outlines" was invented by Shinji Sugihara (Ota-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pattern inspection apparatus includes an actual outline image generation circuit to generate an actual outline image of a predetermined region defined by a function, where the gray scale value of each pixel in the predetermined region including plural actual image outline positions on an actual image outline of a figure pattern in an inspection image is dependent on a distance from th...