ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,825, issued on Aug. 26, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Multi-electron beam image acquisition apparatus, multi-electron beam inspection apparatus, and multi-electron beam image acquisition method" was invented by Kazuhiko Inoue (Yokohama, Japan) and Munehiro Ogasawara (Hiratsuka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A multi-electron beam image acquisition apparatus includes a first electromagnetic lens configured to focus multiple primary electron beams to form an image on a substrate, and a second electromagnetic lens configured to be able to variably adjust a peak position of a magnetic field distributio...