US Patent Issued to NTT on Nov. 18 for "Reflection characteristic analysis device, reflection characteristic analysis method, and reflection characteristic analysis program" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,363, issued on Nov. 18, was assigned to NTT Inc. (Tokyo).

"Reflection characteristic analysis device, reflection characteristic analysis method, and reflection characteristic analysis program" was invented by Riku Omiya (Musashino, Japan), Masashi Iwabuchi (Musashino, Japan), Tomoaki Ogawa (Musashino, Japan) and Yasushi Takatori (Musashino, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A reflection characteristic analysis device analyzes reflection characteristics of a reconfigurable intelligent surface (RIS: Reconfigurable Intelligent Surface). The reflection characteristic analysis device includes a ray trace calculation unit and an electro...