US Patent Issued to NTT on Feb. 3 for "Photomask, optical-waveguide, optical circuit and method of manufacturing an optical-waveguide" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,145, issued on Feb. 3, was assigned to NTT Inc. (Tokyo).

"Photomask, optical-waveguide, optical circuit and method of manufacturing an optical-waveguide" was invented by Takashi Go (Musashino, Japan), Ai Yanagihara (Musashino, Japan), Keita Yamaguchi (Musashino, Japan) and Kenya Suzuki (Musashino, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In an optical circuit divided into a plurality of partial circuits, an optical waveguide having a low optical loss at a connection portion is provided. A photomask in which a waveguide pattern of an optical circuit is divided into a plurality of regions and drawn, the photomask including a waveguide patte...