ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,533, issued on May 20, was assigned to NTT Electronics Corp. (Kanagawa, Japan).
"Optical device manufacturing method and manufacturing apparatus using local etching" was invented by Yoshinori Hibino (Yokohama, Japan), Mikihiro Kurosawa (Yokohama, Japan), Manabu Oguma (Yokohama, Japan), Masahiro Yanagisawa (Yokohama, Japan) and Tomoyuki Yamada (Yokohama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical device manufacturing method and an optical device manufacturing apparatus using local etching are characterized in that in a wafer process of manufacturing a waveguide type optical device including a light-propagating core and a cladding...