US Patent Issued to NTT ADVANCED TECHNOLOGY on Sept. 23 for "Standard sample and manufacturing method thereof" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,453, issued on Sept. 23, was assigned to NTT ADVANCED TECHNOLOGY Corp. (Tokyo).

"Standard sample and manufacturing method thereof" was invented by Akira Kodaira (Tokyo), Takashi Maruyama (Tokyo) and Satoshi Oku (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate (101) is etched by etching processing with crystal anisotropy, thereby forming a recess (104) from the main surface of the substrate (101) to the inside of the substrate (101). A side surface (105) is almost a (111) plane, and the etching hardly progresses. As a result, a cross section of the recess (104) perpendicular to the longitudinal direction has a rectangular shape. Sin...