ALEXANDRIA, Va., July 16 -- United States Patent no. 12,359,968, issued on July 15, was assigned to NOVA LTD. (Rehovot, Israel).
"Systems and methods for optical metrology" was invented by Yonatan Oren (Kiryat Ono, Israel), Eyal Hollander (Ramat Hasharon, Israel), Elad Schleifer (Rehovot, Israel) and Gilad Barak (Rehovot, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi-spot-arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-a...