ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,462, issued on July 15, was assigned to NOVA LTD. (Rehovot, Israel).
"Optical metrology system and method" was invented by Gilad Barak (Rehovot, Israel) and Amir Shayari (Rehovot, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement system for use in optical metrology, the measurement system which includes a control system configured and operable to carry out the following: (i) receive raw measured data generated by a measurement unit that is configured and operable for performing normal-incidence spectral interferometric measurements on a sample and generating the raw measured data indicative of spectral interferometric signals measu...