ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,392,733, issued on Aug. 19, was assigned to NOVA LTD. (Rehovot, Israel).
"Combined ocd and photoreflectance method and system" was invented by Yonatan Oren (Kiryat Ono, Israel) and Gilad Barak (Rehovot, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A combined OCD and photoreflectance system and method for improving the OCD performance in measurements of optical properties of a target sample. The system comprises (a) either a single channel OCD set-up comprised of a single probe beam configured in a direction normal/oblique to the target sample or a multi-channel OCD set-up having multiple probe beams configured in normal and oblique directions t...