US Patent Issued to NOVA MEASURING INSTRUMENTS on July 15 for "System and method for measuring a sample by x-ray reflectance scatterometry" (California Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,063, issued on July 15, was assigned to NOVA MEASURING INSTRUMENTS INC. (Fremont, Calif.).

"System and method for measuring a sample by x-ray reflectance scatterometry" was invented by Heath Pois (Fremont, Calif.), David A. Reed (Belmont, Calif.), Bruno W. Schueler (San Jose, Calif.), Rodney Smedt (Los Gatos, Calif.) and Jeffrey Fanton (Los Altos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously pro...