ALEXANDRIA, Va., June 6 -- United States Patent no. 12,281,893, issued on April 22, was assigned to NOVA MEASURING INSTRUMENTS INC. (Fremont, Calif.).
"Characterizing and measuring in small boxes using XPS with multiple measurements" was invented by Heath Pois (Fremont, Calif.), Wei Ti Lee (Freemont, Calif.), Laxmi Warad (Freemont, Calif.), Dmitry Kislitsyn (Fremont, Calif.), Parker Lund (Sunnyvale, Calif.), Benny Tseng (Hsinchu, Taiwan), James Chen (Hsinchu, Taiwan) and Saurabh Singh (Freemont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A system to characterize a film layer within a measurement box is disclosed. The system obtains a first mixing fraction corresponding to a first X-ray beam, the m...