US Patent Issued to Northwestern University on April 22 for "Systems and methods for direct laser writing" (American, Chinese Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,282,261, issued on April 22, was assigned to Northwestern University (Evanston, Ill.).

"Systems and methods for direct laser writing" was invented by Sridhar Krishnaswamy (Lake Forest, Ill.), Heming Wei (Shanghai), Wisnu Hadibrata (Evanston, Ill.) and Koray Aydin (Wilmette, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of fabricating an object via direct laser lithography are provided. In embodiments, such a method comprises illuminating, via an optical fiber having an end facet and a metalens directly on the end facet, a location within a photosensitive composition from which an object is to be fabricated with light, thereby inducing a mul...