US Patent Issued to NOMURA MICRO SCIENCE, TOHOKU UNIVERSITY on Feb. 10 for "Resist stripping method, resist stripping device, and pretreatment method" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,079, issued on Feb. 10, was assigned to NOMURA MICRO SCIENCE Co. LTD. (Atsugi, Japan) and TOHOKU UNIVERSITY (Sendai, Japan).

"Resist stripping method, resist stripping device, and pretreatment method" was invented by Takayuki Jizaimaru (Atsugi, Japan), Takao Funakoshi (Atsugi, Japan), Yasuyuki Shirai (Sendai, Japan), Hisashi Fujimoto (Sendai, Japan) and Takeshi Sakai (Sendai, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a stripping method capable of stripping a resist while suppressing the time and cost of processing required for stripping, while giving sufficient consideration to the load on the environment. The resist stripping...