ALEXANDRIA, Va., June 4 -- United States Patent no. 12,319,788, issued on June 3, was assigned to NOF Corp. (Shibuya-ku, Japan).
"Phosphorylcholine group-containing polysiloxane monomer" was invented by Yoshiki Tanaka (Kawasaki, Japan), Shu Takashima (Oita, Japan), Norio Iwakiri (Kawasaki, Japan) and Yosuke Matsuoka (Kawasaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The phosphorylcholine group-containing polysiloxane monomer of the present invention is represented by the formula (1). In the formula, a represents an integer of 20 to 500, b represents an integer of 1 to 70, c represents an integer of 1 to 70, d represents 0 or 1, p and q each represent 0 or 1, X represents -CH2- or -CH2CH2-, and R...