ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,994, issued on Oct. 7, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Protective film-forming composition containing diol structure" was invented by Tokio Nishita (Toyama, Japan), Yuto Hashimoto (Toyama, Japan) and Yuki Endo (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A composition for protective film formation can form a flat film that satisfactorily functions as a mask (protection) against wet etchants during semiconductor substrate processing and has a low dry etching rate, the composition having satisfactory covering and recess-filling properties when applied to rugged substrates and having a small thickness difference after th...