ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,972, issued on May 27, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Resist underlayer film-forming composition" was invented by Hiroto Ogata (Toyama, Japan), Hirokazu Nishimaki (Toyama, Japan), Makoto Nakajima (Toyama, Japan), Yuki Mitsutake (Toyama, Japan) and Hayato Hattori (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist underlayer film forming composition contains a reaction product of an aromatic compound (A) having 6 to 60 carbon atoms and a compound represented by formula (B), and a solvent. (In the formula, X represent an oxygen atom or a nitrogen atom; Y represents a single bond, an oxygen atom or a nitrogen atom; X...