US Patent Issued to NISSAN CHEMICAL on June 24 for "Photocurable resin composition containing self-crosslinkable polymer" (Japanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,586, issued on June 24, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Photocurable resin composition containing self-crosslinkable polymer" was invented by Takahiro Kishioka (Toyama, Japan) and Shunsuke Moriya (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photocurable composition including: a self-crosslinking polymer including a first monomer unit including an aryl ketone residue in a side chain, and a second monomer unit including in a side chain an aliphatic hydrocarbon residue including a carbon atom susceptible to a hydrogen abstraction reaction and/or an aromatic ring residue; and a solvent. Also, a method for manufacturing...