US Patent Issued to NISSAN CHEMICAL on June 17 for "Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer" (Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,156, issued on June 17, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer" was invented by Shigetaka Otagiri (Toyama, Japan), Tokio Nishita (Toyama, Japan), Takafumi Endo (Toyama, Japan), Yuki Endo (Toyama, Japan) and Takahiro Kishioka (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A protective film-forming composition including good mask (protection) function against a wet etching liquid and a high dry etching rate during processing of semiconductor substrates, including good coverage even in stepped substrates, and from which flat films ca...