US Patent Issued to NISSAN CHEMICAL on July 29 for "Composition for resist pattern metallization process" (Japanese Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,875, issued on July 29, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Composition for resist pattern metallization process" was invented by Wataru Shibayama (Toyama, Japan), Satoshi Takeda (Toyama, Japan), Shuhei Shigaki (Toyama, Japan), Ken Ishibashi (Toyama, Japan), Kodai Kato (Toyama, Japan) and Makoto Nakajima (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A composition with which collapse and roughness of a resist pattern can be ameliorated and the etching resistance can be improved by metallizing a resist in the resist pattern and a resist pattern metallization method using the composition. A composition for a resist pattern m...