ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,213,382, issued on Jan. 28, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Composition for forming polyvinylidene fluoride film" was invented by Takuma Nagahama (Funabashi, Japan) and Shinichi Maeda (Funabashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a composition for forming a polyvinylidene fluoride film, which contains: a polyvinylidene fluoride; at least one surfactant that is selected from among sulfuric acid-based surfactants, sulfonic acid-based surfactants and quaternary ammonium salt type surfactants; and a solvent."
The patent was filed on Jan. 27, 2020, under Application No. 17/427,195.
*For furt...