ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,243, issued on Dec. 9, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Film-forming composition" was invented by Kodai Kato (Toyama, Japan), Satoshi Takeda (Toyama, Japan), Shuhei Shigaki (Toyama, Japan), Wataru Shibayama (Toyama, Japan) and Makoto Nakajima (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film-forming composition for forming a resist underlayer film for a solvent development type resist that is capable of forming a good resist pattern which contains a hydrolysis-condensation product of a hydrolyzable silane compound, at least one substance that is selected from the group consisting of an aminoplast crosslinking agent a...