US Patent Issued to NISSAN CHEMICAL on Dec. 30 for "Resist underlayer film-forming composition containing alicyclic compound-terminated polymer" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,823, issued on Dec. 30, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Resist underlayer film-forming composition containing alicyclic compound-terminated polymer" was invented by Hiroyuki Wakayama (Toyama, Japan), Ryuta Mizuochi (Toyama, Japan), Shou Shimizu (Toyama, Japan) and Yasunobu Someya (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the above-described resist underlayer film forming composition. A resist unde...