ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,503, issued on Sept. 23, was assigned to NIPPON STEEL CHEMICAL & MATERIAL Co. LTD. (Tokyo).
"Material for photoelectric conversion element for imaging" was invented by Atsushi Kawada (Tokyo), Munetomo Inoue (Tokyo) and Kentaro Hayashi (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a material that achieves higher sensitivity and higher resolution of a photoelectric conversion element for imaging, and a photoelectric conversion element for imaging using the above material. A material for a photoelectric conversion element for imaging, the material having a structure of the following general formula (1), wherein L each independentl...