US Patent Issued to NIKON on Oct. 7 for "Exposure apparatus, exposure method, device manufacturing method, and device" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,468, issued on Oct. 7, was assigned to NIKON Corp. (Tokyo).

"Exposure apparatus, exposure method, device manufacturing method, and device" was invented by Yoji Watanabe (Kumagaya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus includes: a substrate stage onto which a substrate is to be mounted; an exposure unit radiating an exposure light toward the draw-out electrode on at least one semiconductor chip; a pattern determination unit determining an exposure pattern; and a controller controlling the substrate stage and the exposure unit. The pattern determination unit determines a pattern of a relay wiring connecting the draw...