US Patent Issued to NIKON on Jan. 27 for "Analyzing method, analysis apparatus, measuring method, measurement apparatus, exposing method, and exposure apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,747, issued on Jan. 27, was assigned to NIKON Corp. (Tokyo).

"Analyzing method, analysis apparatus, measuring method, measurement apparatus, exposing method, and exposure apparatus" was invented by Ayako Sugimoto (Kumagaya, Japan), Ryugo Iida (Chofu, Japan) and Shinji Wakamoto (Saitama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An analyzing method includes preparing measured position information that is position information of a plurality of measured-parts formed on a substrate, and fitting a reference function, which is a sum of at least one function obtained by multiplying a criterion function expressed using a first type Bessel functio...