US Patent Issued to NIKON on Jan. 13 for "Exposure apparatus, measuring device, measuring method, and device manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,940, issued on Jan. 13, was assigned to NIKON Corp. (Tokyo).

"Exposure apparatus, measuring device, measuring method, and device manufacturing method" was invented by Yoji Watanabe (Kumagaya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus includes: an exposure illumination optical system illuminating a spatial light modulator which has a plurality of spatial light modulation elements having a reflecting surface disposed on a disposition plane; a projection optical system projecting light from the spatial light modulator to an exposed substrate; a first detection unit detecting light from the reflecting surface; a second d...