US Patent Issued to NHK Spring on Nov. 25 for "Circuit pattern, semi-finished base material for circuit substrate, metal-based circuit substrate, production method for circuit pattern, and production device for circuit pattern" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,484,144, issued on Nov. 25, was assigned to NHK Spring Co. Ltd. (Yokohama, Japan).

"Circuit pattern, semi-finished base material for circuit substrate, metal-based circuit substrate, production method for circuit pattern, and production device for circuit pattern" was invented by Shinya Yano (Yokohama, Japan) and Misao Uetake (Hachioji, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A circuit pattern is obtained, capable of being easily applicable to current increase, making short circuit or ion migration between adjacent circuit conductors hard to be generated, and allowing a circuit pattern to be tightly arranged. A circuit pattern comprises a c...