ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,649, issued on Nov. 18, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).

"Wafer placement table" was invented by Hiroshi Takebayashi (Handa, Japan), Tatsuya Kuno (Nagoya, Japan) and Seiya Inoue (Handa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer placement table includes a ceramic base, a first cooling base, and a second cooling base. The ceramic base has a wafer placement surface and incorporates a wafer attracting electrode and a heater electrode. The first cooling base is bonded via a metal bonding layer to a surface of the ceramic base on a side opposite to the wafer placement surface and has a first refrigerant flow channel ...