US Patent Issued to NGK INSULATORS on May 27 for "Stacked structure and semiconductor manufacturing apparatus member" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,757, issued on May 27, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).

"Stacked structure and semiconductor manufacturing apparatus member" was invented by Asumi Nagai (Okazaki, Japan), Noboru Nishimura (Nagoya, Japan) and Hirofumi Yamaguchi (Komaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A stacked structure includes a first structure formed of a composite sintered body that contains AlN and MgAl2O4 as main phases, and a second structure formed of a ceramic sintered body and stacked on and bonded to the first structure. A difference in linear thermal expansion coefficient between the first structure and the second structure is les...