US Patent Issued to NGK INSULATORS on Dec. 16 for "Wafer placement table" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,071, issued on Dec. 16, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).

"Wafer placement table" was invented by Tatsuya Kuno (Nagoya, Japan), Seiya Inoue (Handa, Japan), Hiroshi Takebayashi (Handa, Japan) and Masaki Ishikawa (Handa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer placement table is a wafer placement table that includes a refrigerant flow channel through which refrigerant is flowed and includes a top base including a ceramic base incorporating an electrode and having a wafer placement surface on a top surface of the ceramic base, a bottom base on a top surface of which a flow channel groove defining a side wall and ...