US Patent Issued to NEXCHIP SEMICONDUCTOR on March 25 for "Overlay mark, overlay marking method and overlay measuring method" (Chinese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,661, issued on March 25, was assigned to NEXCHIP SEMICONDUCTOR Corp. (Hefei, China).

"Overlay mark, overlay marking method and overlay measuring method" was invented by Kuotung Yang (Anhui, China), Hui Liu (Anhui, China) and Ke Yuan (Anhui, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure discloses an overlay mark, an overlay marking method and an overlay measuring method. The overlay marking method includes at least: preparing a first material layer; preparing a first mark group on the first material layer, and the first mark group is a centrally symmetrical pattern; preparing a second material layer on the first materia...