ALEXANDRIA, Va., June 6 -- United States Patent no. 12,283,464, issued on April 22, was assigned to NEW POWER PLASMA Co. LTD. (Suwon-si, South Korea).
"Plasma reaction device" was invented by Dai Kyu Choi (Seoul, South Korea) and Eun Seok Lim (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a plasma reaction device which can reduce a heating value through installation of a dual-coil type inductor in a resonant network circuit part, and a cooling method thereof. The plasma reaction device may include: a reactor part for exciting an input gas to be in a plasma state by using transformer coupled plasma; a resonant network circuit part electrically connected to the reactor part a...