US Patent Issued to Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO on June 17 for "Lithographic patterning method and system therefore" (Dutch Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,574, issued on June 17, was assigned to Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO ('s-Gravenhage, Netherlands).

"Lithographic patterning method and system therefore" was invented by Diederik Jan Maas (Breda, Netherlands), Jacques Cor Johan Van Der Donck (Alphen aan Den Rijn, Netherlands), Maarten Hubertus Van Es (Voorschoten, Netherlands), Chien-Ching Wu (Delfgauw, Netherlands), Klara Maturova (Pijnacker, Netherlands) and Robert Wilhelm Willekers ('s-Gravenhage, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Lithographic patterning method for creating features on a surface of a substrate, including the s...