US Patent Issued to NEC on Oct. 14 for "Controlling illumination apparatus based on overlap state between iris area and reflection area" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,235, issued on Oct. 14, was assigned to NEC Corp. (Tokyo).

"Controlling illumination apparatus based on overlap state between iris area and reflection area" was invented by Ryuichi Akashi (Tokyo), Kosuke Yoshimi (Tokyo), Yuka Ogino (Tokyo) and Ryo Yamakabe (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An illumination control apparatus 3 comprises: a detection unit 311 that detects an iris area IA and a reflection area RA in an eye image IMG_E generated by imaging eyes of a target being illuminated with illumination light IL from an illumination apparatus 2, the iris area IA and the reflection area RA corresponding to an iris of the eyes and ...