ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,941, issued on June 24, was assigned to NEC Corp. (Tokyo).
"Biometric authentication device, biometric authentication method, and biometricauthentication program" was invented by Ryoma Oami (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A biometric authentication device, by utilizing difference distance information obtained on the basis of in-focus information indicating the degree of focusing in an image of a subject serving as the target of biometric authentication and an estimated distance to the subject obtained from the distance between feature points in the image, generates a corrected distance in which a deviation between the estimated...