US Patent Issued to Nearfield Instruments on Sept. 30 for "Arrangement for and method of determining cantilever deflection in a scanning probe microscopy system" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,496, issued on Sept. 30, was assigned to Nearfield Instruments B.V. (Rotterdam, Netherlands).

"Arrangement for and method of determining cantilever deflection in a scanning probe microscopy system" was invented by Hamed Sadeghian Marnani (Rotterdam, Netherlands), Arseniy Kalinin (Rotterdam, Netherlands) and Kevin Henri Louis Makles (Rotterdam, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention is directed at an arrangement for determining cantilever deflection in a scanning probe microscopy system. The system includes a scan head supporting a probe, including the cantilever and a probe tip, comprising a specular reflective sur...