US Patent Issued to Nearfield Instruments on July 1 for "Alignment system and method for aligning an object having an alignment mark" (Dutch Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,036, issued on July 1, was assigned to Nearfield Instruments B.V. (Rotterdam, Netherlands).

"Alignment system and method for aligning an object having an alignment mark" was invented by Hamed Sadeghian Marnani (Rotterdam, Netherlands), Taras Piskunov (Schiedam, Netherlands) and Erik Tabak (Rotterdam, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An alignment system and method for aligning an object (O) having an object marker. An image of the object marker is projected onto an imaging sensor (11) having sensor elements. At least one reference marker is projected onto the imaging sensor (11). Based on image output (111) from the imaging s...