ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,344, issued on Sept. 23, was assigned to National Yang Ming Chiao Tung University (Hsinchu, Taiwan).
"Method of manufacturing semiconductor device" was invented by Edward Yi Chang (Hsinchu County, Taiwan), Shih-Chien Liu (Taoyuan, Taiwan), Chung-Kai Huang (Kaohsiung, Taiwan), Chia-Hsun Wu (Kaohsiung, Taiwan), Ping-Cheng Han (Taichung, Taiwan), Yueh-Chin Lin (New Taipei, Taiwan) and Ting-En Hsieh (Tainan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a semiconductor device includes providing a substrate. A channel layer is formed on the substrate. A barrier layer is formed on the channel layer. A source and a drain ...