ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,557, issued on May 27, was assigned to NATIONAL TAIWAN NORMAL UNIVERSITY (Taipei, Taiwan).
"Formaldehyde detecting device" was invented by Chia-Jung Lu (Taipei, Taiwan) and Rih-Sheng Jian (New Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A formaldehyde detecting device includes a formaldehyde detecting unit which includes a formaldehyde detecting layer, a diffusion restricting member and a concentration indicator. The formaldehyde detecting layer includes a formaldehyde detecting material that develops color when reacting with formaldehyde. The diffusion restricting member is disposed on the formaldehyde detecting layer and permits ...